Plasma-kg

consistsOf

• Advanced Energy Navio  Diagnostic Device
• grounded reactor vessel 
• plane electrodes 

diagnosedUsing

• Infrared Laboratories 4.2K Bolometer  Diagnostic Device
• Model 3502, New Focus  Diagnostic Device
• R&S RTO 1014  Diagnostic Device
• Tektronix AFG 3022 C  Diagnostic Device
• tunable THz QCL  Diagnostic Device

diagnosedUsing

• Terra Hertz (THz) Absorption Spectroscopy  Diagnostic Method
• high-resolution absorption spectroscopy  Diagnostic Method

generates

• CCRF discharge in argon  Plasma
• CCRF discharge in helium  Plasma
• Low-pressure RF plasma  Plasma
• Non-Thermal Plasma  Plasma
• Weakly-Ionized Plasma  Plasma
• low-pressure capacitively coupled radio frequency oxygen discharge  Plasma

hasApplicationField

• Basic Research  Application Field
• Etching  Application Field
• Film Deposition  Application Field

hasConfiguration

• Configuration for CCP: planar RF electrode diameter 120 mm; powered at 13.56 MHz; RF electrode positioned 55 mm beneath top surface of grounded reactor vessel (diameter 240 mm, height 105 mm); applied RF power 20-100 W; base pressure <5E-4 mbar; operating pressure 0.7 or 1.3 mbar; O2 flow rate 70 sccm 
• DC and RF low-pressure glow discharges in argon using a plane-parallel electrode configuration; Constant DC voltage of 350V; Sinusoidal voltage with voltage ampitude of 350V and frequency of 13.56 MHz; Gap distance of 1 cm; Pressure of 1 Torr; Temperature of 300 K; Constant gas temperature and pressure. 
• Low-pressure RF plasma between plane electrodes separated by the distance d, driven by a sinusoidal voltage with amplitude V0 and frequency f; d = 2.5 cm (argon) resp. 6.7 cm (helium); V0 = 50-250 V; f = 13.56 MHz; Current density: 10 A/m^2; Gas temperature: 300 K; Pressure: 10-80 Pa 

hasDescription

• AC, high frequency, low pressure, non-thermal 

hasDeviceType

• Capacitively Coupled Plasma (CCP)  Plasma Source Type
• Capacitively Coupled Radio-Frequency (CCRF) Discharge  Plasma Source Type

hasProperty

• Properties of the CCP source: asymmetric discharge; planar RF electrode made of stainless steel with a diameter of 120 mm; grounded reactor vessel made of aluminum, cylindrically shaped, with a diameter of 240 mm and a height of 105 mm 

hasSpecification

• AC, high frequency, low pressure, non-thermal 
• Specification for CCP: AC, high frequency, low pressure, non-thermal; planar RF electrode diameter 120 mm; cylindrical reactor vessel diameter 240 mm, height 105 mm 

partOf

• Advanced Energy Cesar 133  Diagnostic Device

plasmaSourceOf

• Benchmark data for fluid modelling of low-pressure CCRF discharge plasmas  Plasma Study
• High-speed thermal microscopy of plasma microprinting at atmospheric pressure  Plasma Study
• MCPlas, a MATLAB toolbox for reproducible plasma modelling with COMSOL  Plasma Study
• Terahertz absorption spectroscopy for measuring atomic oxygen densities in plasmas  Plasma Study
• Validation of THz absorption spectroscopy by a comparison with ps-TALIF measurements of atomic oxygen densities  Plasma Study
• comparative studies of capacitively coupled radio-frequency (CCRF) discharges in helium and argon  Plasma Study

treats

• O2  Medium

usedIn

• comparative studies of capacitively coupled radio-frequency (CCRF) discharges in helium and argon  Plasma Study

usesMaterialEntity

• TSU 062, Pfeiffer Balzers  Device
• oxygen gas cylinder, Air Liquide  Device

usesMedium

• Ar  Medium
• H2  Medium
• He  Medium
• N2  Medium
• O2  Medium