configurationOf
- Capacitively Coupled Plasma (CCP) Source Plasma Source
Configuration for CCP: planar RF electrode diameter 120 mm; powered at 13.56 MHz; RF electrode positioned 55 mm beneath top surface of grounded reactor vessel (diameter 240 mm, height 105 mm); applied RF power 20-100 W; base pressure <5E-4 mbar; operating pressure 0.7 or 1.3 mbar; O2 flow rate 70 sccm
Plasma-kg
consistsOf
- Applied RF power = 20 W - 100 W
- Base pressure < 5E-4 mbar
- Electrode to vessel top distance = 55 mm
- O2 gas flow rate = 70 sccm
- Operating pressure = 0.7 mbar
- Operating pressure = 1.3 mbar
- RF electrode diameter = 120 mm
- Reactor vessel diameter = 240 mm
- Reactor vessel height = 105 mm
- sinusoidal voltage frequency f = 13.56 MHz