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• Configuration for CCP: planar RF electrode diameter 120 mm; powered at 13.56 MHz; RF electrode positioned 55 mm beneath top surface of grounded reactor vessel (diameter 240 mm, height 105 mm); applied RF power 20-100 W; base pressure <5E-4 mbar; operating pressure 0.7 or 1.3 mbar; O2 flow rate 70 sccm 
• Specification for CCP: AC, high frequency, low pressure, non-thermal; planar RF electrode diameter 120 mm; cylindrical reactor vessel diameter 240 mm, height 105 mm 
• Specification for the CCP: AC, high frequency, low pressure, non-thermal; planar RF electrode diameter: 120 mm; grounded reactor vessel diameter: 240 mm; grounded reactor vessel height: 105 mm