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- Configuration for CCP: planar RF electrode diameter 120 mm; powered at 13.56 MHz; RF electrode positioned 55 mm beneath top surface of grounded reactor vessel (diameter 240 mm, height 105 mm); applied RF power 20-100 W; base pressure <5E-4 mbar; operating pressure 0.7 or 1.3 mbar; O2 flow rate 70 sccm
- Configuration for Centura 5200: Radio frequency (RF) excitation at 13.56 MHz; RF power 600 W; Chamber wall temperature 288 K; Substrate temperature 288 K; Total gas flow 100 sccm; Total pressure 100 mTorr
- Configuration of the CCP: RF power: 20-100 W; Frequency: 13.56 MHz; Electrode distance: 55 mm
- DC and RF low-pressure glow discharges in argon using a plane-parallel electrode configuration; Constant DC voltage of 350V; Sinusoidal voltage with voltage ampitude of 350V and frequency of 13.56 MHz; Gap distance of 1 cm; Pressure of 1 Torr; Temperature of 300 K; Constant gas temperature and pressure.
- Low-pressure RF plasma between plane electrodes separated by the distance d, driven by a sinusoidal voltage with amplitude V0 and frequency f; d = 2.5 cm (argon) resp. 6.7 cm (helium); V0 = 50-250 V; f = 13.56 MHz; Current density: 10 A/m^2; Gas temperature: 300 K; Pressure: 10-80 Pa