Plasma-kg

consistsOf

• Ar  Medium
• CF4  Medium
• CHF3  Medium

diagnosedUsing

• Q-MACS process fiber system, neoplas control  Diagnostic Device

diagnosedUsing

• Quantum Cascade Laser Absorption Spectroscopy (QCLAS)  Diagnostic Method

generatedBy

• Centura 5200, Applied Materials  Plasma Source

hasProperty

• Properties of CF4/CHF3/Ar gas mixture: Total flow 100 sccm; Total pressure 100 mTorr 

involvedIn

• On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes  Plasma Study