Plasma-kg

developedBy

• Sairem  Company

generates

• Microwave Plasma  Plasma
• low pressure electron cyclotron resonance hydrogen plasma  Plasma

hasApplicationField

• ALD  Application Field
• Biological Decontamination  Application Field
• Etching  Application Field
• PECVD  Application Field
• Plasma-Enhanced Chemical Vapor Deposition (PECVD)  Application Field
• Reactive Species Generation  Application Field
• Surface Treatment  Application Field
• activation  Application Field
• diamond growth  Application Field

hasConfiguration

• Configuration for AURA-WAVE: microwave frequency excitation 2.45 GHz; applied power range 100 – 150 W; chamber wall temperature varied in the range of 20° – 100°C; volume of the plasma reactor about 80 l 

hasDeviceType

• Electron Cyclotron Resonance (ECR) Coaxial Plasma Source  Plasma Source Type

hasSpecification

• Specification for AURA-WAVE (Sairem): microwave, low pressure, AC, non-thermal, microwave frequency excitation 2.45 GHz, applied power range 50 – 150 W 
• Specification for AURA-WAVE: microwave, low pressure, AC, non-thermal 

partOf

• plasma reactor  Device

plasmaSourceOf

• Evidence of the Dominant Production Mechanism of Ammonia in a Hydrogen Plasma with Parts Per Million of Nitrogen  Plasma Study
• Verified modeling of a low pressure hydrogen plasma generated by electron cyclotron resonance  Plasma Study

usedIn

• Evidence of the Dominant Production Mechanism of Ammonia in a Hydrogen Plasma with Parts Per Million of Nitrogen  Plasma Study
• Verified modeling of a low pressure hydrogen plasma generated by electron cyclotron resonance  Plasma Study

usesMedium

• Ar  Medium
• H2  Medium
• Hydrogen with Nitrogen admixtures  Medium
• N2  Medium
• O2  Medium