Plasma-kg

developedBy

• VG Scienta 

hasConfiguration

• Configuration for XPS setup: Pass energy 200 eV; Monochromatic Al-Kα radiation; Charging compensation with electron flood gun (Si 2p peak shifted to 103.5 eV) 

hasDeviceType

• X-ray source  Device Type

hasSpecification

• Specification for MX 650 X-ray source: monochromatic Al-Kα radiation 

measures

• Si 2p peak binding energy = 103.5 eV 

usedIn

• On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes  Plasma Study

usedToDiagnose

• Si Wafer  Target
• ULK samples