Plasma-kg

hasDeviceType

• Mass Flow Controller (MFC)  Device Type

measures

• CH4 flow during conditioning = 8 slh 
• O2 flow in set 1 = 4.8 slh 
• O2 flow in set 2 = 1.6 slh 
• Total gas flow = 100 sccm 
• Total gas flow = 80 slh 
• Total gas flow for multi-filament arrangement = 300 sccm 

partOf

• active screen plasma nitrocarburizing (ASPNC) reactor  Plasma Source
• multi-filament arrangement 
• single-filament arrangement 

usedIn

• Impact of the electrode proximity on the streamer breakdown and development of pulsed dielectric barrier discharges  Plasma Study
• Laser absorption spectroscopy for plasma-assisted thermochemical treatment  Plasma Study
• Upscaling from single- to multi-filament dielectric barrier discharges in pulsed operation  Plasma Study

usedToDiagnose

• N₂/O₂ mixture  Medium