Plasma-kg

developedBy

• neoplas control GmbH 

hasDeviceType

• Optics  Device Type

partOf

• Q-MACS process fiber system, neoplas control  Diagnostic Device

usedIn

• On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes  Plasma Study

usedToDiagnose

• SiF4