Plasma-kg

developedBy

• Sentech 

hasConfiguration

• Configuration for SE850 system: Incident angles 50°, 60°, and 70°; Wavelength range 400-850 nm 

hasDeviceType

• Ellipsometer  Device Type

hasSpecification

• Specification for SE850 system: incident angles 50°, 60°, and 70°; wavelength range 400-850 nm 

usedIn

• On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes  Plasma Study

usedToDiagnose

• Si Wafer  Target
• ULK samples 
• damaged SiOCH film 
• non-damaged SiOCH film 
• polymer film