Oerlikon Metco F4MB-XL
Plasma Source
Plasma-kg
developedBy
diagnosedUsing
- Boundary Layer Model Diagnostic Method
- Microarc Model Diagnostic Method
generates
- Argon plasma Plasma
- Thermal Plasma Plasma
- background argon plasma Plasma
- non-equilibrium plasma near the electrodes Plasma
- plasma jet in a mixture of Ar and H2 Plasma
- pure Ar plasma Plasma
hasApplicationField
- Plasma Spraying Application Field
- coating Application Field
- plasma spraying Application Field
hasConfiguration
- Arc current of 600 A
- Arc current of 800 A
- Configuration for Oerlikon Metco F4MB-XL in Ar/H2 mixture: Electric current = 600 A; Gas feed = mixture of Ar (40 NLPM) and H2 (14 NLPM)
- Configuration for Oerlikon Metco F4MB-XL in pure Ar: Electric current = 600 A; Gas feed = pure Ar
- Electric current: 600 A; Gas flow rate: 40 NLPM
- Electric current: 600 A; Gas flow rate: 60 NLPM
- Electric current: 600 A; Gas flow rate: 80 NLPM
- Electric current: 800 A; Gas flow rate: 40 NLPM
- Electric current: 800 A; Gas flow rate: 60 NLPM
- Electric current: 800 A; Gas flow rate: 80 NLPM
- Flow rates between 40 and 80 NLPM and direct electric current of several hundred amperes
hasDescription
- Flow rates between 40 and 80 NLPM and direct electric current of several hundred amperes
- Properties of Oerlikon Metco F4MB-XL: single-cathode and single-anode arrangement; WL10 cathode made of lantanated tungsten; nozzle is cylindrically symmetric and serves as anode; cylindrical fragment is partly made of tungsten; cathode base and nozzle are water cooled; gas is fed between the cathode and the anode; electric current is 600 A
hasDeviceType
- Plasma Torch Plasma Source Type
hasProperty
hasSpecification
- DC, atmospheric pressure, thermal
- Specification for Oerlikon Metco F4MB-XL: DC, thermal, atmospheric pressure
- Specification for Oerlikon Metco F4MB-XL: DC; atmospheric pressure; thermal; single-cathode and single-anode arrangement; water cooled cathode base and nozzle; gas is fed between the cathode and the anode
involvedIn
plasmaSourceOf
treats
- Al_2O_3 particles Target
- substrate Target
- tungsten cathodes
usedIn
usesMedium
- Ar Medium
- Pure argon Medium
- mixture of Ar and H2 Medium
- mixtures of argon with hydrogen Medium
- mixtures of argon with nitrogen Medium